Conference on Frontiers of Characterization and Metrology for Nanoelectronics

The conference organizers are pleased to announce a call for papers at the 2017 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) which will be held at the Monterey Marriott in Monterey, CA, Mar. 21-23, 2017. Monterey is a scenic California coastal city that rises from the pristine Monterey Bay to pine forested hillsides with sweeping bay views. This is the 11th in the series of conferences devoted to metrology frontiers for the semiconductor industry. The conference will examine the latest advances in characterization and metrology, including applications beyond CMOS, that will help shape the future of the nanoelectronics industry.

The conference is organized via a partnership between NIST, the AVS, FIAP/APS, NSF, and SEMI. For additional details, topics, confirmed speakers, and registration information please visit the FIAP/APS website or our website. Please feel free to forward the link to interested colleagues.

For questions please feel free to contact David Seiler, at david.seiler@nist.gov.

Regards,
David Seiler, NIST

Opinions expressed represent the views of the individual authors and not the American Physical Society or author’s employers.